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KMID : 0362819920120010041
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Journal of the Korean Academy of Implant Dentistry
1992 Volume.12 No. 1 p.41 ~ p.57
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PHOTOELASTIC ANALYSIS OF STRESSES INDUCED BY VARIOUS SUPERSTRUCTURES ON THE ENDOSTEAL IMPALNT
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Choi Young-Hee
Cho In-Ho
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Abstract
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The osseointegrated implant conducts the stress directly to the bone due to lack of cushioning effect of periodontal ligament. So，the design and material quality of superstructure plays an important role in resolution and diffusion of stress. Recently, the various superstructures have been developed to improve esthetics and resolve various complicated conditions. The purpose of this study was to evaluate the stress induced by various system on the oseointegrated implant using UCLA abutment, EsthetiCone abutment, Anatomic abutment as well as Branemark conventional abutment. The stress distribution was evaluated by the photoelastic method which can simultaneously observe all around stress distribution. The superstructures embedded in epoxy resion specimen were loaded at various angle with a force of 15kg to analyse the stress distribution of the fixture. 1. Under vertical loading, the large and broad stress was distributed below the fixture in all systems. 2. The firnge order of the stress was increased in proportion to tilting the specimen. The largest stress was shown in 25 angled degree tilting case. 3. The Branemakr conventional abutment showed the lowest value, and EsthetiCone abutment, Anatomic abutment and UCLA abutment showed the stress value in accending order.
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